EFEK VARIASI SUHU ANNEALING YANG DI-DOPING BORON TERHADAP MORFOLOGI NANOROD ZnO
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Date
2016-05-19
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Abstract
ZnO nanorods have successfully grown on the surface of FTO (Fluorine Tin Oxide) by
hydrothermal method at a temperature of 90˚ C for 8 hours. This study was conducted
to analyze the effect of variations in annealing temperature of 200˚C, 250˚C, 300˚C,
350˚C and 400˚C with Boron doped of 1% to the morphology of the resulted ZnO
nanorods. Samples were characterized by using the methods of Field Emission
Scanning Microscope (FESEM) and Energy Dispersive X-Ray (EDX). FESEM
characterization results showed that Boron-doped ZnO nanorods grew up on the surface
of the FTO having hexagonal cross-sectional shape with a diameter in the range of 100-
500 nm. The variation of annealing temperature produced ZnO nanorods with various
diameters. The best homogenity level sample is for 300˚C. The cross-sectional FESEM
images showed that nanorods ZnO height generated increased with increment of
annealing temperature. EDX spectra showed that by increasing annealing temperature,
the percentage of the number of atoms and weight of boron increased.
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Keywords
Nanorod Zink Oxide (ZnO),, doped, doped, FESEM, EDX